Surface Science
Qi-Kun Xue, China (Chair) Peter Varga, Austria (Co-Chair) Joseph A. Stroscio, USA (Co-Chair) Maki Kawai, Japan (Co-Chair) Young Kuk, Korea (Co-Chair) Martin Aeschlimann, Germany Jesper Andersen, Sweden Alison Baski, USA Karel Masek, Czeck Masaru Tsukada, Japan Julia Phillips, USA Ali Yazdani, USA Andrew Wee, Singapore Jjinfeng Jia, China Bing Wang, China Kai Wu, China Jiandong Guo, China Zhaoxiong Xie, China Xi Chen, China
Applied Surface Science
Laszlo Kover, Hungary (Chair) Paul M. Koenraad, The Netherland (Co-Chair) Daisuke Fujita, Japan (Co-Chair) John Grant, USA (Co-Chair) Zhenchao Dong, China (Co-Chair) Alexander Jablonski, Poland Alex Shard, UK Shigeo Tanuma, Japan Wolfgang Werner, Austria Alberto Herrera Gomez, Mexico Tom Reinecke, USA Peter Grutter, Canada Vicki Colvin, USA Zuimin Jiang, China Jian Zi, China Junyong Kang, China Shimin Hou, China Xiaohui Qiu, China Pimo He, China Haiming Guo, China
Nanoscience and Technology
Lars Montelius, Sweden (Chair) Hong-Jun Gao, China (Co-Chair) Masakazu Aono, Japan (Co-Chair) Robert M. Westervelt, USA (Co-Chair) Hajo Freund, Germany (Co-Chair) Nancy Burnham, USA Lars Samuelson, Sweden Hiroshi Tokumoto, Japan Yukio Hasegawa, Japan Hans-Joachim Güntherodt, Switzerland John Boland, Ireland W. Hofer, UK Hong Guo, Canada K. Kern, Germany Xudong Xiao, HongKong Lijun Wan, China Chen Wang, China Zheng Hu, China Dapeng Yu, China Yubao Li, China Weiping Cai, China Yi Xie, China Yadong Li, China Shuhong Yu, China
Electronic Materials and Processing
Gary E. McGuire,USA (Chair) Michelle Y. Simmons, Australia (Co-Chair) Ning-Sheng Xu, China (Co-Chair) Gunther Springholz, Austria (Co-Chair) Alfred Huan, Singapore (Co-Chair) Markus Pessa, Finland Robert G Elliman, Australia Jean-Pierre Landesman, France Hajime Asahi, Japan Fred Ruddell, UK Alexander Liddle, USA Mats Persson, UK Amadeo Vazquez de Parga, Spain Lloyd Whitman, USA Yong Cao, China Yi Luo, China Lianmao Peng, China Yong Qiu, China Yi Shi, China Ming Liu, China Changzhi Gu, China Deren Yang, China Shushen Li, China
Surface Engineering
Ivan Petrov, USA (Chair) Lars Hultman, Sweden (Co-Chair) De-Chun Ba, China (Co-Chair) Jeon G. Han, Korea (Co-Chair) Christian Mitterer, Austria Thierry Czerwiec, France Frank Richter, Germany Vasco Teixeira, Portugal Ulf Helmersson, Sweden Yuan Su, China Bin Yang, China Yi Jin, China Zhengxian Li, China Xiubo Tian, China
Thin Films
Olinda Conde, Portugal (Chair) Feng Pan, China (Co-Chair) Angus Rockett, USA (Co-Chair) Tsuneya Ando, Japan (Co-Chair) Phil Martin, Australia (Co-Chair) Alberto Tagliaferro, Italy Christoph Eisenmenger-Sittner, Austria Juan Pedro Espinós Manzorro, Spain Eva Majkova, Slovakia Gaorong Han, China Kewei Xu, China Chuang Dong, China Yanrong Li, China Yanfeng Chen, China Qun Zhang, China Fei Zeng, China
Bio-interfaces
Pietro Favia, Italy (Chair) Harold G. Craighead, USA (Co-Chair) Jun Hu, China (Co-Chair) Christoph Gerber, Switzerland (Co-Chair) Paul Weiss, USA Shaoyi Jiang, USA Peter Kingshott, Denmark Sunil Kumar, Australia Maria de Fátima Raposo, Portugal Dmitry Shtansky, Russia Ning Gu, China Hongchen Gu, China Donglu Shi, China Gang Jin, China Jiandong Ding, China Xingyu Jiang, China Xiaohui Zhang, China Zhiyong Qian, China
Plasma Science and Technology
David N. Ruzic, USA (Chair) Bao-Nian Wan, China (Co-Chair) Alenka Vesel, Slovenia (Co-Chair) Geun-Young Yeom, Korea (Co-Chair) Espedito Vassallo,Italy Fransisco Tabares, Spain Mohan Sankaran, USA Yuichi Setsuhara, Japan Seiji Samukawa, Japan H.Y. Chang, Korea Baoping Wang, China Min Yu, China Xiaolin Yan, China Ruilin Liu, China Younian Wang, China Wei Yu, China
Vacuum Science & Technology
Manfred Leisch,Austria (Chair) Xu Chen, China (Co-Chair) Timothy A. Gessert, USA (Co-Chair) Tatsuo Okano, Japan (Co-Chair) Janez Setina, Slovenia Yoshio Saito, Japan Karl Jousten, Germany Jay Hendricks, USA Jean-Louis Bersier, France Zhenlin Lei, China Xilong Wang, China Meng Tao, China Yong Wang, China Dixin Zhang, China Changqi Chen, China
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